Lab & Facilities

The research facilities include thin-film deposition and materials purification equipment, thin-film and optoelectronic device characterization tools, and high-resolution optical and topographical microscopy instruments. In particular, we have several characterization tools for thermal imaging at micron and submicron spatial scales, as well as novel probe-based, sub-wavelength optical imaging. We are actively constructing novel thin-film device fabrication tools, including atmospheric organic vapor jet printing (OVJP) and reel-to-reel deposition.

UV-Vis spectrometer

Location: 2067 Dow
200-1100nm, fiber-coupled, USB; made by Ocean Optics

Vacuum Thermal Evaporator (Angstrom Engineering Inc)

Location: 2001 Dow
Base pressure: 5 x 10^-8 Torr
Typical deposition pressure: 10^-7 Torr
Compatible Materials: Small molecule organics (e.g. Alq3, CuPc, C60) and non-refractory metals (e.g. Al, Au, Ag, Mg)
Substrate size: 4 inches diameter

High Vaccum Mobile Sample Transfer System
Location: 2001 Dow

Scanning Probe Microscope (Molecular Imaging / Agilent)
Location: 2211A G. G. Brown
Techniques: Conventional AFM-based techniques as well as scanning thermal microscopy and near-field optical microscopy based on probes fabricated in our lab.

CCD-Based Thermoreflectance
Location: 2211A G. G. Brown
High-resolution thermal imaging of electronic and optoelectronic device